Fabrikasi Lapisan Tipis C-Cr pada Permukaan Si dengan Menggunakan Metode Sputtering
DOI:
https://doi.org/10.29122/mipi.v8i3.3664Keywords:
Thin film, X-ray diffraction, Conductance, Surface, RamanAbstract
Telah dilakukan pembuatan lapisan tipis karbon-krom (C-Cr) pada permukaan Si. Pelapisan C-Cr pada permukaan Si merupakan eletrode dalam bentuk lapisan tipis. Pengukuran struktur kristal lapisan tipis C-Cr pada permukaan Si dilakukan dengan difraksi sinar-x, pola difraksi yang nampak yaitu puncak C dan Cr. Ukuran kristalit dan regangan lapisan tipis C-Cr yaitu 18,40Â A dan regangan 17,78 %. Pengukuran sifat listrk pada pelapisan karbon-krom (C- Cr) dan tanpa pelapisan meliputi konduktansi dan kapasitansi. Dari hasil pengukuran menunjukkan konduktansi lapisan tipis C-Cr dan kapasitansi menurun dengan kenaikan frekuensi, begitu juga dalam bentuk pellet C-Cr dan substrat Si. Hasil analisis permukaan dengan SEM menunjukkan lapisan tipis C- Cr. Pengujian lapisan tipis ini dilakukan guna mengetahui terbentuknya lapian tipis C-Cr dengan ditemukannnya unsur C dan Cr pada permukaan substrat Si. Dari spektrum Raman diperoleh panjang gelombang pada puncak yaitu 538 cm- 1. Hal ini menunjukkan adanya interaksi antara C dan Cr, sehingga puncak yang nampak adalah puncak karbon.
Kata kunci : Lapisan tipis, Difraksi sinar-x, Konduktasni, Permukaan, Raman.
Abstract
To had been done to make thin film of C-Cr on Si surface. Deposition carbon-chrom ( C-Cr ) on Si surface was electrode shape in the thin film. The measurement ctystall structure thin film of C-Cr on Si surface tobe done was with x-ray diffraction which was C and Cr. The crystall size and strain of C-Cr thin film was 18.40Â A and strain 17.78 %. The measurement electrical properties on deposition of C-Cr and without deposition as follow conductance and capacitance. The result indicated, that conductance of C-Cr thin film and capacitance decreased with increasing of frequence and also pellet shape of C- Cr and C substract. The result of surface morphology with SEM, indicate to had became of thin film C-Cr on the Si surface. The examine thin film tobe done for know what the thin film of C-Cr was shaped with find out C and Cr on the Si substrate surface. From Raman spectrum tobe find out wave number on the peak 520.56 cm-1, indication that interaction between C and Cr, so that peeak which visible was pek of C.
Key word : Thin film, X-ray diffraction, Conductance, Surface, Raman
References
B.A. Tjipto Sujitno, Aplikasi Plasma dan Teknologi Sputtering Untuk Surface Treatment, Diktat Kuliah. P3TM BATAN Yogyakarta, 5-9 Mei 2003.
N. Sinha, Carbon Naotubes for Biomedical Application, Tansaction on Nanobioscience,No.2,2005, p180.
N. Sinha, J. Ma, and J.T.W. Yeow, Carbon Nanotube-Based Sensors, J.of. Nanosience and Nanotechnology, Vol.6, 2006, p573.
H. Sudjatmoko dan B.A. Tjipto Sujitno,†Workshop Sputtering Untuk rekayasa Permukaan Bahanâ€, Diktat Kuliah. P3TM BATAN Yogyakarta, 5-9 Mei 2003.
Patricia Lubis, Altje Ltununuwe dan Toto Winata, Penumbuhan Nanopartikel Nikel Dengan DC Unbalanced Magnetron Sputtering, J. Nanosains dan Nanoteknologi, Edisi Khusus Agustus 2009, p71-73.
S. Hwang, H. Choi, Y. Kim, Y. Han, H. Kim, M. Kang and M. Jeon, Influence of the Electrical Conductivity of the Silicon Substrate on the Growth of MWCNT, J of the Korean Physical Society, Vol.58,No.2, 2011, p248.
P .R. Bandaru, Electrical Properties and Application of Carbon Nanotube Structure, J.of. Nanoscience and Nanotechnoloy, Vol. 7, 2007, p1.
C. Lu and Y. Wing Mai, Anomalous Electrical Conductivity and Percolation in Carbon Nanotubes Composite, J. Materials Science, Vol.43, 2008,p6011.
A.M. Bondar and I. Iordache, Carbon/ceramic Composite Designed for electrical Application, J.of Optoelectronics and and Advance Materials, Vol.8, 2006, p631.
K.G. Williamson and W.H. Hall, “ X-Ray Line Broading From Filed Al and Wolframâ€,Acta.Met, Vol. 1 ,No.1 1953, p22.
K.N.R. Rehani, P.B. Joshi, K.N. Lad and A. Pratap, Crystallite Size Estimatin of Elemental and Composite Silver Nano Powder Using XRD Prisiciple, Indian J.of Pure Physics, Vol. 44, 2006, p157.
S.G. Zotawa, R.G. Vitchev and B. Blanpain,†Phase Composition of Cr-C Thin Film Deposite by a Double Magnet Sputtering System, Surface and Interface System.30 (2000) 544-548.
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