STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING

Authors

  • Setyo Purwanto R&D Centrefor Materials Science and Technology-BATAN
  • Isao Sakamoto Photonics Research Institute, AIST—JAPAN'
  • M. Koike Photonics Research Institute, AIST—JAPAN'
  • H. Tanoue Photonics Research Institute, AIST—JAPAN'

DOI:

https://doi.org/10.17146/jusami.2003.5.1.5201

Keywords:

Fe/Si Multilayer, structural and magnetic properties, helicon plasma Sputtering, magnetoresistance

Abstract

STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING. Helicon plasma sputtering method has been used to grown the Fe/Si multilayer (MLs) with various thickness of Silicon spacer around 0.5 ~ 2nm for Fe thickness fixed at 2nm in order to investigated the antiferromagnetic coupling behaviour. Also we grown the MLs with various Fe thickness around 2-5nm for Silicon spacer fixed at tSi =l nm and l.5nm. Present study found that in case of Silicon spacer thickness tSi= l nm multilayer film exhibit antiferromagnetically ordering, beside this thickness the MLs are ferromagnetic. The maximum magnetoresistance ratio is 0.22%, it appears at the Fe thickness tFe=3nm and Si thickness tSi=l nm.

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Published

31-10-2003

How to Cite

Setyo Purwanto, Isao Sakamoto, M. Koike, & H. Tanoue. (2003). STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING. Jurnal Sains Materi Indonesia, 5(1), 24–28. https://doi.org/10.17146/jusami.2003.5.1.5201

Issue

Vol. 5 No. 1 (2003): Jurnal Sains dan Materi Indonesia

Section

Articles

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