PENUMBUHAN DAN KARAKTERISASI FILM TIPIS ZnO YANG DIDEPOSISI DENGAN TEKNIK SPIN COATING DIATAS SUBSTRAT SILIKON
DOI:
https://doi.org/10.17146/jsmi.2014.15.3.4347Keywords:
Film tipis ZnO, FWHM, Ukuran butir, Spin coating, Temperatur deposisiAbstract
PENUMBUHAN DAN KARAKTERISASI FILM TIPIS ZnO YANG DIDEPOSISI DENGAN TEKNIK SPIN COATING DIATAS SUBSTRAT SILIKON. Telah dilakukan deposisi film tipis ZnO di atas substrat Si (001) dengan teknik spin coating, sebagai kandidat lapisan anti refleksi sel surya silikon. Zinc acetate dehydrate, 2-methoxyethanol dan mono ethanolamine berturut-turut digunakan sebagai material dasar, pelarut dan penstabil.Kekristalan filmtipis ZnOhasil deposisi dikarakterisasi menggunakan X-RayDiffractometer (XRD). Hasil karakterisasi XRD menunjukkan bahwa puncak intensitas pola difraksi sinar-X terjadi pada 2-theta sekitar 34,40 derajat, bersesuaian dengan orientasi bidang kristal (002). Hal ini menunjukkan bahwa film tipis ZnO hasil deposisi memiliki orientasi kristal tunggal ke arah sumbu-c, vertikal terhadap permukaan silikon. Kualitas kekristalan filmtipis ZnO ditentukan berdasarkan nilai Full Width at Half Maximum (FWHM) puncak intensitas pola difraksi sinar-X dan ukuran rata-rata butir kristal. Nilai FWHM ditentukan dengan bantuan software Microcal Origin sedangkan ukuran rata-rata kristal dihitung dengan menggunakan formula Debye-Scherrer berdasarkan data hasil karakterisasi XRD. Hasil perhitungan menunjukkan bahwa FWHM film tipis ZnO yang dideposisi pada temperatur 700 oC nilainya relatif kecil yaitu sekitar 0,39 nm dan ukuran rata-rata kristalnya sekitar 21,33 nm. Hal ini menunjukkan bahwa dari segi kekristalan film tipis ZnO hasil deposisi memiliki kualitas yang cukup baik. Nilai FWHM dan ukuran rata-rata butir kristal film tipis ZnO nilainya berubah ketika temperatur deposisi (T) diubah.
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